Heidelberg, Germany, (PRWEB) November 26, 2005
Heidelberg Instruments, GmbH, Heidelberg, Germany, announced the purchase of a DWL66 maskless lithography system by Nankai University Center for Optics Research, located in Tianjin, China. The DWL66 is a unique, maskless lithography system for mask making and direct writing. This system is capable of producing patterns down to 0.6 microns, and is equipped with the capability of thick resist and grey scale exposure, in addition to metrology, front to backside and layer to layer alignment.
“DWL66 systems continue to be a leading laser lithography solution among the research institutions and we are very pleased that Nankai University selected our DWL66 maskless lithography system for their projects in micro optics.” Alexander Forozan, Vice President of World Wide Sales and Marketing, Heidelberg Instruments, GmbH.
About Heidelberg Instruments, GmbH
With an installation base in over 20 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems capable of exposing substrates up to 2.4 meter by 1.9 meter. These systems are used for direct writing and photomask production, in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other exciting applications.
Heidelberg Instruments, GmbH
VP, World Wide Sales and Marketing
Phone: +49 6221 3430 73