Hillsboro, Oregon (PRWEB) December 4, 2005
Phoseon Technology (http://www.phoseon.com) today announced that it will show a new high intensity semiconductor-based ultraviolet light system at the SGIA Digital Expo in Phoenix AZ, December 8th -10th 2005. The system - known as the RX Starfire – is based on the company’s revolutionary SLM (Semiconductor Light Matrix) technology.
The RX Starfire continues the key advantages of Phoseon’s SLM UV light sources when compared to standard lamp-based UV systems, providing pure UV light output with low heat generation, significant reductions in power usage, and significantly longer lifetimes. The product’s physical package is far more environmentally attractive and cost effective than that of mercury-based light sources, providing an efficient system that is very easy for OEMs to integrate and operate.
The RX Starfire system is designed to complement Phoseon’s growing RX family of wide area UV light systems to serve larger format UV Ink Jet applications. In addition to ink curing, Phoseon’s RX products are used in applications such as adhesive curing and the curing of paints and coatings.
RX Starfire will be available for customer shipment in the First Quarter of 2006.
To see these Phoseon UV light systems please join us at the SGIA Digital Expo at the Phoenix Convention Center, December 8th-10th at Booth 1621.