Heidelberg, Germany (PRWEB) May 12, 2006
Heidelberg Instruments announced the sale of an advanced DWL400 maskless laser lithography system to the Institute of Optics, Information and Photonics (Max Planck Research Group) at the University of Erlangen-Nuremberg.
The DWL400 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 400 mm by 400 mm.
"The laser lithography will be mainly used for direct writing of microstructured optical elements and materials. We especially appreciate the openness of HIMT towards new ideas that involve changing hard- or software and are looking forward to this cooperation." states Dr. Sabine Koenig, project coordinator at the Institute of Optics, Information and Photonics.
“In most research environments, performance and flexibility are crucial to success of various projects," says Alexander Forozan, Vice President of Sales and Marketing. “At the University of Erlangen-Nuremberg Institute of Optics, this is realized by customization, in addition to existing capabilities crucial for micro optics research such as grey scale exposure (128 levels), ability to expose thick resist and layer to layer alignment.”
About the Institute of Optics, Information and Photonics, University of Erlangen-Nuremberg: Optics research has a tradition at the University of Erlangen-Nuremberg. The Center for Modern Optics, established in 2000, consolidates existing research projects and links the faculties of the natural sciences, medicine, and technology, particularly the areas of materials science and communications engineering. As a result many synergies arise, which also benefit the Research Group. The Group investigates basic research problems in the areas of optical metrology, light wave communications, optical materials, and optics in biology and medicine.
About Heidelberg Instruments, GmbH:
With an installation base of more than 250 systems in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.