Heidelberg, Germany (PRWEB) June 18, 2006
Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the Institut National de la Recherche Scientifique, Canada.
The DWL66 fs maskless lithography system is capable of binary and grey scale exposure, layer to layer alignment, and is able to produce minimum features down to 0.6 microns.
“We look forward to support INRS with their innovative research and development of new materials and components in micro-electronics and photonics, with applications in high speed telecommunication systems. Our DWL66 fs will be used for direct write rapid prototyping and photomask making. ” says Alexander Forozan, Vice President of Sales and Marketing, Heidelberg Instruments.
About INRS Micro and Nano Research: The Laboratory for Micro and Nanofabrication (LMN) of the “Institut National de la Recherche Scientifique” (INRS, University of Quebec) is a brand new state-of-the-art laboratory dedicated to nanotechnology research. The LMN has the tooling for complete process flow allowing fabrication of advanced prototypes in nanoelectronic, millimeter wave and photonic science. Because of its links with other INRS labs involved in femtoscience research and in life and energy science, the LMN is well positioned to play an important role in many important fields like aerospace, transportation and biomedical research.
About Heidelberg Instruments, GmbH: With an installation base of more than 250 systems in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.