CVD Materials Business of Morgan Technical Ceramics Introduces Ultra-Pure Silicon Carbide Sputtering Targets

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CVD SiC Targets Produce High-Purity SiC Films with Reduced Risk of Contamination.

SiC Sputtering Targets

The CVD Materials business of Morgan Technical Ceramics (MTC) introduces high-purity silicon carbide (SiC) sputtering targets for physical vapor deposition (PVD) applications. The MTC SiC sputtering targets enable the deposition of high-purity SiC thin films for demanding applications such as the manufacturing of magnetic disk drive heads. Dielectric SiC films deposited from MTC's CVD SiC targets have higher density, higher thermal conductivity and lower expansion coefficient than dielectric aluminum oxide films, enhancing device performance and enabling new device design structures.

The MTC CVD SiC sputtering targets are manufactured by a chemical vapor deposition (CVD) process, resulting in a homogeneous and monolithic SiC target material unlike sintered SiC targets that are formed using powders, binders and sintering aids. This is an important benefit since sintered SiC targets are vulnerable to particle release, or spitting, during the sputtering process. MTC's CVD SiC targets contain no particles to spit.

In addition, because MTC's CVD SiC sputtering targets are ultra-pure - 99.9995% based on GDMS analysis for metallic impurities - highly pure and uniform SiC films are consistently produced. The SiC films ensure the absence of etch residue (contamination) from reactive ion etch processes that can be used to pattern the SiC film.

The high density and complete lack of porosity in the MTC CVD SiC sputtering targets results in negligible outgassing of the target, and suitability for use in ultra-high vacuum conditions. Further, MTC's CVD SiC have a thermal conductivity that is twice that of sintered SiC targets and are highly resistant to thermal shock, allowing high-power process conditions to be used to achieve a fast SiC film deposition rate via RF diode and RF or DC magnetron sputtering.

MTC offers SiC targets ranging in size from 3 inches to 20 inch diameter or squarer, eliminating the need to tile together smaller pieces.

About Morgan Technical Ceramics
Morgan Technical Ceramics (MTC) has a comprehensive range of Ceramic materials, from which its products are manufactured. Supplying to a variety of demanding markets, MTC has established an enviable reputation for providing value-added solutions through world-class research and development, innovative design and, perhaps most important of all, application engineering.
Morgan Advanced Ceramics, together with Morgan Electro Ceramics forms Morgan Technical Ceramics, a division of the Morgan Crucible Company plc. From manufacturing locations in North America, Europe, Asia and Australia, Morgan Technical Ceramics supplies an extensive range of products, including ceramic components, braze alloys, ceramic/metal assemblies and engineered coatings.

For more information on Morgan Technical Ceramics visit http://www.morgantechnicalceramics.com or contact one of the sales offices below:

Europe
Morgan Technical Ceramics, Bewdley Road, Stourport, Worcestershire, DY13 8QR.
Tel: +44 1299 872210     Fax: +44 1299 872218
Email: mtcuksales @ morganplc.com

North America
Morgan Technical Ceramics, 26 Madison Road, Fairfield, NJ 07004, USA
Tel: +1 800 433 0638 Fax: +1 973 227 7135
Email: mtcussales @ morganplc.com

Asia
Morgan Technical Ceramics, 158 Jiajian Road, Jiading, Shanghai 201818, People's Republic of China.
Tel: +86 21 5990 0687 Fax: +86 21 5990 3241
Email: mtccnsales @ morganplc.com

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Nicole Followell
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