Torrance, CA (PRWEB) April 7, 2011
Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to Karlsruhe Institute of Technology, Germany.
The DWL 66FS maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features.
“The KIT/IMT’s DWL 66FS maskless lithography system will become part of the Karlsruhe Nano- and Micro Facility http://www.knmf.kit.edu/ which provides an open platform for structuring and characterizing a multitude of functional materials, components, and systems at the micro- and nanoscale. The machine will mainly complement IMT’s E-Beam machine for microstructure pattern generation. The main focus will be on patterning of areas larger than 5 inch and on 3D-elements that will add functionality to IMT’s LIGA technology,” states Dr. Joachim Schulz, leader of the Flagship-Projekt.
About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.