(PRWEB) January 25, 2012
Heidelberg Instruments extends its leadership in manufacturing of direct write lithography systems with the launch of µPG 501 table top system. Designed with the focus on high performance at an affordable price, the μPG 501 is the perfect solution for prototyping various devices such as MEMS, integrated Optics, microfluids, Lab-on-a-Chip, as well as mask production. The system has the ability to write structures down to1 μm at a speed of 50 mm²/min. This equals an exposure time of less than one hour for a 2“x 2“ pattern. With a footprint of only 60 x 75 cm² the μPG 501 comes with a wide range of capabilities.
System is equipped with the data conversion software which is simple to operate and provides basic design operations, and features a viewer for the design data as well as for the converted pixel data. The software supports multiple data formats such as GDSII, DXF, GERBER, CIF, BMP, and STL. μPG 501 is equipped with a high power LED light source, providing exceptional reliability and very long lifetime. The standard available wavelengths are 390 or 405 nm.
Other wavelengths may be available up on request. The μPG 501 can expose standard positive and negative photo resists as well as UV-resists such as SU8. Since the intensity dose is not limited, the system is suitable for applications which require thick resists. Utilizing sophisticated Gray Scale Exposure technology, the μPG 501 has the ability to create 3 dimensional structures such as blazed gratings or micro-lenses.
The light engine features the Digital Micromirror Device (DMD™) as the imaging device, a platform which is already available in the market and has been constantly improved
for usage in commercial as well as R&D applications. Besides enabling high throughput, a major advantage of the DMD™ is, it‘s reliability in the visible as well as in the UV spectrum of the illumination.
The integrated metrology system enables the μPG 501 to do overlay exposures either by manual or automatic alignment to multiple targets on the substrate. Company’s field proven Autofocus System compensates flatness variation of the substrate in real-time. This is an essential feature
especially for high-resolution lithography systems. Custom made vacuum chucks can hold substrates with various sizes up to 5”. The stage is driven by powerful linear motors and controlled by encoders at a resolution of 20 nm.
“The μPG 501 exemplifies Heidelberg Instruments continuing innovation aimed at extending advanced lithography technologies” said Alexander Forozan, head of Global Sales and Business Development at Heidelberg Instruments. “This system will present researchers with a fantastic tool at an affordable price, enabling them to conduct low volume lithography without using
photomasks and mask aligners.”
About Heidelberg Instruments, GmbH: With an installation base in over 40 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
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