SPIE Announces 2012 Optics and Photonics Scholarship Recipients

SPIE, the international society for optics and photonics, has named 140 outstanding individuals as winners of $350,000 in scholarships in recognition of their potential for long-range contribution to the field.

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To date, SPIE has distributed over $3.3 million dollars in individual scholarships, reflecting the Society's commitment to education and to the next generation of optical scientists and engineers.

Bellingham, WA (PRWEB) June 29, 2012

SPIE has awarded $350,000 in scholarships to 140 outstanding individuals, based on their potential for long-range contribution to optics and photonics, or a related discipline. Award-winning applicants were evaluated and selected and approved by the SPIE Scholarship Committee.

2012 top scholarship winners include:

The SPIE D.J. Lovell Scholarship was awarded to Maria Serkkova, National Research University of ITMO. This is the Society's most prestigious scholarship, and is sponsored by SPIE.

Nutan Gautam, University of New Mexico, was awarded the John Kiel Scholarship which was established to honor SPIE founding member John Kiel, in recognition of his long-standing and significant contributions to the society. This scholarship is sponsored by SPIE and is awarded for the student's potential for long-term contribution to the field of optics and optical engineering.

The Laser Technology, Engineering and Applications Scholarship was awarded to Anton Tcypkin, National Research University of ITMO. This scholarship is awarded in recognition of the student's scholarly achievement in Laser Technology, Engineering, or Applications. Funds are provided in part by SPIE.

The Optical Design and Engineering Scholarship was awarded to Cristina Canavesi, University of Rochester. The scholarship was established in memory of Bill Price and Warren Smith, both well-respected members of SPIE's technical community. This scholarship is awarded to a full-time graduate or undergraduate student in the field of optical design and engineering.

Elizaveta Yankovskaya, National Research University of ITMO, was awarded the BACUS Photomask Scholarship. This scholarship is awarded to an undergraduate or a graduate student in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies. This scholarship is sponsored by BACUS, SPIE's Photomask International Technical Group

Other 2012 SPIE scholarship recipients include students in Africa, Asia, South America, Europe, the Middle East, North America, and South Pacific region.

To date, SPIE has distributed over $3.3 million dollars in individual scholarships. This ambitious effort reflects the Society's commitment to education and to the next generation of optical scientists and engineers around the world.

About SPIE

SPIE is the international society for optics and photonics, a not-for-profit organization founded in 1955 to advance light-based technologies. The Society serves nearly 225,000 constituents from approximately 150 countries, offering conferences, continuing education, books, journals, and a digital library in support of interdisciplinary information exchange, professional growth, and patent precedent. SPIE provided over $2.7 million in support of education and outreach programs in 2011.


Contact

  • Stacey Crockett
    SPIE
    360 685 5458
    Email