(PRWEB) September 13, 2012
Heidelberg Instruments announced the sale of a DWL 2000 maskless laser lithography system to the Chinese Academy of Sciences Institute of Microelectronics Research (IMECAS).
The DWL 2000 advanced maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features at a fast exposure speed. System will be used for research and development in advanced memory device (nanocrystal floating gate and resistive switching memory device), nano-electronic device and integrated technology, molecular electronic devices, fabrication and detection of diffractive optical elements as well as micro/nano-sensor and its integration.
“China’s focus to implement knowledge based economy presents a great opportunity for technology equipment manufacturers and solution providers such as Heidelberg Instruments. We are very pleased that IMECAS, one of the most prestigious centers and the key research institute of Microelectronics technology and innovation in China has selected the DWL 2000 system for its advanced R&D activities. ” states Alexander Forozan, Head of Sales and Marketing, Heidelberg Instruments.
About Heidelberg Instruments, GmbH: With an installation base in over 40 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.