University of Pennsylvania Purchases Nanonex Advanced Nanoimprint Tool NX-2600 BA

Nanonex Corporation, the inventor and world’s leading provider in nanoimprint lithography solutions with the longest history, announces the delivery of Nanonex’s NX-2600BA system to University of Pennsylvania.

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Nanonex: Engine for nanotechnology

Princeton, NJ (PRWEB) December 25, 2012

Nanonex Corporation, the inventor and world’s leading provider in nanoimprint lithography solutions with the longest history, announces the delivery of Nanonex’s NX-2600BA system to University of Pennsylvania.

The Nanonex NX-2600BA purchased by Wolf Nanofabrication Facility at University of Pennsylvania is a full wafer nanoimprinter and photolithography aligner. It has up to 8 inches wafer patterning capability in all imprint forms: thermal, photo-curable and embossing with sub-5 nm imprinting resolution, as well as high resolution photolithography. It features sub-1 micron front side alignment accuracy and optical backside alignment ability. Based on the Nanonex unique patented Air Cushion Press TM technology, the NX-2600BA offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, which significantly increases mask lifetime.

The Wolf Nanofabrication Facility is multiuser cleanroom facility at University of Pennsylvania. Nanonex is proud to support the cutting edge research at University of Pennsylvania, and NX-2600BA will serve as multi task lithography equipment for various research purposes in the Wolf Nanofabrication Facility at University of Pennsylvania, such as optics, displays, biotechnologies, data storage, materials and so on.

About Nanonex Corporation:

Nanonex is the inventor of NIL, the world’s first nanoimprint lithography company, and the world’s leading provider of nanoimprint solutions that include equipment, masks, resists and processes. Nanonex’s patented and proprietary NIL solutions and Air-Cushion Press ™ can manufacture 3D nanostructures with sub-5 nm resolution, large-area uniformity, accurate overlay alignment, high throughput, and low cost. Nanonex NIL solutions have been adopted by a broad spectrum of applications, such as optical devices, data storage, displays, light emitting diodes, semiconductor ICs, biotech, chemical synthesis, and advanced materials. Nanonex has over 100 customers and an installed base of over 50 tools world-wide. Visit http://www.nanonex.com for additional information.


Contact

  • Jim Wang
    Nanonex
    (609) 903-8638
    Email