This latest patent further solidifies our position as the leader in silane vapor deposition.
Livermore, CA (PRWEB) February 28, 2013
Yield Engineering Systems, Inc. (YES), a Bio-MEMS equipment manufacturer, announced today that they have received a third patent from the United States Patent & Trademark Office for their vapor deposition system, the YES-1224P. This innovative tool provides total environmental control over the deposition process and provides a superior silane/substrate bond that is stable after exposure to atmosphere.
This patent is extremely important to YES because it covers the YES-1224P vapor deposition process. The patent is titled "Method for Efficient Coating of Substrates Including Plasma Cleaning and Dehydration".
"Acquiring this process patent demonstrates the value and importance of our YES-1224P," said Bill Moffat, Founder and CEO of YES, "This latest patent further solidifies our position as the leader in silane vapor deposition."
Two YES employees, Bill Moffat and Ken Sautter, developed the process documented by the patent which was issued Patent Number US 8,361,548 B2.
For more information regarding the YES-1224P, visit http://www.yieldengineering.com or contact them toll free in the USA or Canada at 888-937-3637 or worldwide at +1-925-373-8353.
About Yield Engineering Systems, Inc.
YES was founded in 1980, and is headquartered in Livermore, California, USA. They provide quality process equipment for semiconductor, photovoltaic, FPD, MEMS, medical, nanotech industries and more.
They manufacture high temperature vacuum cure ovens, silane vapor deposition systems, plasma etch and clean tools used for precise surface modification, surface cleaning, and thin film coating of semiconductor wafers, semiconductor and MEMS devices, biosensors and medical slides.