Global Nanopatterning Market to Reach $481.48 million by 2012, According to New Report by Global Industry Analysts, Inc.

Share Article

GIA announces the release of a comprehensive global report on Nanopatterning market. Though conventional optical lithography techniques are widely used for fabricating integrated circuit chips with feature sizes up to sub-100nm, their downside is the very expensive nature of the high-tech lithography systems, which has restricted their usage to industries having access to ample funds. New, unconventional nanopatterning techniques attempt to fill this void by offering low-cost, high-throughout imprinting processes.

Nanopatterning: A Global Strategic Business Report

Continued research to pattern nanometer scale features using different materials and resists has ensued the emergence and progress of hot embossing, UV-NIL, microcontact printing, and dip-pen nanolithography, among others. Still under research is nanostencil lithography, a high-resolution, shadow mask method with dynamic potential.

Among the Nanopatterning technologies, Nanoimprint Lithography (NIL) exhibits the most promising outlook. With anticipation that NIL emerges successful for commercial semiconductor manufacturing at 32nm node in the near future, the market for NIL is projected to grow the fastest between 2008 and 2015. Of the NIL techniques, UV nanoimprint lithography is projected to grow the fastest from 2008 to 2015. Another NIL technique expected to perform exceedingly well is hot embossing lithography.

The second largest nanopatterning market, Scanning Probe Lithography, would see its share decline from 2008 to 2015. Among the diverse applications, semiconductor applications and microelectronics fabrication represent the largest nanopatterning application.

The global marketplace is characterized by participants such as Ambios Technology, Inc. (USA), AMO GmbH (Germany), EV Group (Austria), Hewlett-Packard Development Company, L.P. (USA), IMS Chips (USA), International Business Machines Corp. (USA), Micro Resist Technology GmbH (Germany), Molecular Imprints, Inc. (USA), NanoInk, Inc. (USA), Nanonex Corp. (USA), NanoOpto Corp. (USA), NIL Technology (Denmark), Obducat AB (Sweden), Optomec, Inc. (USA), Sigma-Aldrich Corp. (USA), STMicroelectronics N.V. (Switzerland), SUSS MicroTec AG (Germany), Toppan Photomasks, Inc. (USA), Transfer Devices, Inc. (USA), Veeco Instruments, Inc. (USA), and Vistec Semiconductor Systems GmbH (Germany).

"Nanopatterning: A Global Strategic Business Report" announced by Global Industry Analysts, Inc. provides a comprehensive review of market trends, technologies, techniques, players, competition, research & development, recent developments, mergers, acquisitions, and other strategic industry activities. Global analysis is presented for nanopatterning technologies such as Nanoimprint Lithography (including hot embossing, UV-NIL, Microcontact Printing and others), Scanning Probe Lithography, and Other.

For more details about this comprehensive market research report, please visit -

About Global Industry Analysts, Inc.
Global Industry Analysts, Inc., (GIA) is a reputed publisher of off-the-shelf market research. Founded in 1987, the company is globally recognized as one of the world's largest market research publishers. The company employs over 800 people worldwide and publishes more than 1100 full-scale research reports each year. Additionally, the company also offers thousands of smaller research products including company reports, market trend reports, and industry reports encompassing all major industries worldwide.

Global Industry Analysts, Inc.
Telephone 408-528-9966
Fax 408-528-9977
Email press (at) StrategyR (dot) com
Web Site


Share article on social media or email:

View article via:

Pdf Print

Contact Author

Public Relations
Visit website