Rohm and Haas Introduces Next Generation VisionPad(TM) CMP Pad for Shallow Trench Isolation

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Rohm and Haas Electronic Materials, CMP Technologies, a leader and innovator in chemical mechanical planarization (CMP) technology for the global semiconductor industry, today announced the VisionPad(TM) 5000 CMP pad, the latest addition to its advanced VisionPad platform. Specifically designed for defectivity reduction in shallow trench isolation (STI) and interlayer dielectric (ILD) applications, the new pad targets volume manufacturing of memory and logic chips at 65 nm and below.

The VisionPad 5000 is the newest pad designed and manufactured in line with our application-specific approach to CMP pads, allowing us to deliver the highest performing and most consistent new technologies for specific process steps

    The VisionPad 5000 features an advanced polymer specifically designed by CMP Technologies to lower defectivity on all types of commercial slurries. Also key to the design of VisionPad 5000 is an optimized pore size and pore concentration. Rohm and Haas has done extensive R&D to fully understand the complex relationship between polymers, pore size and pore density. This knowledge resulted in the design of unique pads targeted at specific processes. The mechanics of STI scratch defects during CMP are directly related to the interaction of materials at the interface of the pad with the wafer surface. To address this issue, Rohm and Haas developed the VisionPad 5000 with an optimized polymer and pore structure designed to improve the robustness of STI CMP processes. In addition, the VisionPad 5000 achieves a 50 percent reduction in CMP-induced scratch and chatter marks over current materials. The VisionPad 5000 results in improved planarization overall and when coupled with ceria-based polishing slurries, the removal rate is also enhanced.

"The VisionPad 5000 is the newest pad designed and manufactured in line with our application-specific approach to CMP pads, allowing us to deliver the highest performing and most consistent new technologies for specific process steps," stated Dave Ventura, pad marketing director for Rohm and Haas Electronic Materials, CMP Technologies. The continual line shrinks in microchip devices demands lower defects during CMP polishing steps, and this becomes especially critical for non-metal applications.

To achieve lower defectivity with good planarity, the VisionPad 5000 uses an energy absorbent polymer in a unique formulation. It has demonstrated performance factors that are equal to the industry standard IC1000(TM) pad -- including removal rate, dishing, erosion, process window and planarity -- while reducing defectivity by at least 50 percent. Other features include a long pad lifetime and multiple grooving, sub-pad and adhesive configurations. Polishing and conditioning recommendations are also offered by Rohm and Haas.

The VisionPad 5000 pads offer predictable pad-to-pad performance and stable operation throughout the process. To ensure the highest quality and consistency, all VisionPad products are manufactured using stringent SPC/SQC methods. VisionPad products will be manufactured and supported in Rohm and Haas's new facility in Taiwan as well as the Company's existing manufacturing site in the United States. VisionPad 5000 CMP pads are now available for sampling.

The Rohm and Haas new pad will be featured during the SEMICON Korea trade show (Booth 1356, Atlantic 3-F Hall).

About Rohm and Haas Electronic Materials

Rohm and Haas Electronic Materials develops and delivers innovative material solutions and processes to the electronic and optoelectronic industries. Focused on the circuit board, semiconductor manufacturing, advanced packaging, and flat panel display industries, its products and technologies are integral elements in electronic devices around the world.

The CMP Technologies business has been a leader and innovator in polishing technology for the global semiconductor industry since 1969. CMP Technologies products include polishing pads, conditioners and slurries. CMP Technologies maintains operations throughout the world, including manufacturing facilities in Newark, Delaware, Hsinchu, Taiwan and in the Mie and Kyoto prefectures in Japan. Additional information is available at

About Rohm and Haas Company

Leading the way since 1909, Rohm and Haas (NYSE:ROH) is a global pioneer in the creation and development of innovative technologies and solutions for the specialty materials industry. The company's technologies are found in a wide range of markets including: Building and Construction, Electronics, Food and Retail, Household and Personal Care, Industrial Process, Packaging, Paper, Transportation and Water. Our innovative technologies and solutions help to improve life everyday, around the world. Based in Philadelphia, PA, the company generated annual sales of approximately $8.2 billion in 2006. Visit for more information. Imagine the possibilities(TM).

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Karen M. Winkelman
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