SPIE Optical Metrology to present advances in measurement and inspection

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New research in optical measurement technologies enabling applications in industry, research modeling, inspection of nanostructures and artwork, and related topics will be presented at SPIE Optical Metrology 13-16 May. The programme includes talks in five technical areas as well as rewarding networking opportunities.

SPIE Optical Metrology, the field’s premier conference in Europe for scientists, engineers, researchers and applications and product developers, will be held 13-16 May at the International Conference Centre Munich with the World of PHOTONICS Congress.

Among featured talks, Wim Coene (ASML Research) will give a plenary lecture on “Challenges in optical metrology for photo-lithography.”

Optical Metrology covers new optical principles and systems for metrology, videometrics and machine vision with applications in industrial design, production engineering, process monitoring, maintenance support, biotechnology, vehicle navigation, multimedia technology, architecture, archaeology and arts. Conference topics are:

  •     Optical Measurement Systems for Industrial Inspection, chair Peter Lehmann, Univ. Kassel: optical metrology methods and their applications in solving measurement problems in industrial design, production engineering and process monitoring.
  •     Modeling Aspects in Optical Metrology, chair: Bernd Bodermann, Physikalisch-Technische Bundesanstalt: optical metrology modeling as a prerequisite for traceable and comparable measurements.
  •     Optics for Arts, Architecture, and Archaeology, chairs Luca Pezzati, Istituto Nazionale di Ottica Applicata, and Piotr Targowski, Nicolaus Copernicus Univ.: advanced optical methodologies for the study, documentation, safeguarding, preservation, and conservation of cultural heritage.
  •     Videometrics, Range Imaging and Applications, chairs Fabio Remondino, Fondazione Bruno Kessler, and Mark Shortis, RMIT Univ.: advances in precise 3D measurement and accurate modeling from imaging and range sensors.
  •     Optical Methods for Inspection, Characterization, and Imaging of Biomaterials, chairs Pietro Ferraro, Istituto Nazionale di Ottica, and Monika Ritsch-Marte, Innsbruck Medical Univ.: development of new and smart diagnostic metrological tools of biomaterials, to furnish quantitative data to optimize engineering design, fabrication and characterization of biomaterials.
  •     Automated Visual Inspection, chairs Jürgen Beyerer, Karlsruher Instituts für Technologie, and Fernando Puente León, Technische Univ München: image acquisition and image exploitation topics to solve visual inspection tasks automatically.

Symposium Chairs are Wolfgang Osten, Univ. Stuttgart; Karsten Buse, Fraunhofer-Institut für Physikalische Messtechnik; and Andrew Moore, Heriot-Watt Univ.

Networking opportunities for students will include a leadership workshop for SPIE Student Chapter officers featuring lecturer Jean-luc Duomont (Principiæ), and a luncheon for SPIE Students and Fellows.

More information is on the conference website: http://www.spie.org/om.

Accepted papers will be published in the SPIE Digital Library as soon as approved after the meeting, and in print volumes and digital collections.

Sponsored by SPIE Europe, Optical Metrology is part of the biennial World of PHOTONICS Congress along with other conferences organized by WLT (German Scientific Laser Society/Wissenschaftliche Gesellschaft Lasertechnik), EOS (European Optical Society), OSA, IEEE Photonics Society and EPS (European Physical Society).

SPIE is the international society for optics and photonics, a not-for-profit organization founded in 1955 to advance light-based technologies. The Society serves nearly 225,000 constituents from approximately 150 countries, offering conferences, continuing education, books, journals, and a digital library in support of interdisciplinary information exchange, professional networking, and patent precedent. SPIE provided $3.3 million in support of education and outreach programs in 2012.

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