Park Systems Invites Customers to Visit Their Booth 1523 at the 2013 Fall ACS National Meeting and Exposition

Park Systems, a leader in Atomic Force Microscopy (AFM) since 1997, is exhibiting at the 246th Fall ACS National Meeting and Exposition Sept 8-12, 2013 in Indianapolis, IN. Showcased at the Park Systems booth will be Park NX10, the industry’s most accurate AFM, and the two new AFM advanced features: Step and Scan Automation, a feature that makes Park AFM very easy to use, and Approach Retract Scanning, a conductive AFM mode that greatly increases the resolution and bandwidth for conductivity studies.

  • Share on TwitterShare on FacebookShare on Google+Share on LinkedInEmail a friend

Park NX10

“We are excited to be exhibiting at ACS Fall to meet with customers and researchers to exchange information about nanotechnology and the advancements Park has pioneered in the field of atomic force microscopy,” explains Keibock Lee, Park Systems President.

Santa Clara (PRWEB) August 31, 2013

Park Systems, a leader in Atomic Force Microscopy (AFM) since 1997, is exhibiting at the 246th Fall ACS National Meeting and Exposition Sept 8-12, 2013 in Indianapolis, IN. This year’s exposition features nearly 7,200 presentations on new discoveries in science. Attendees will get an opportunity to meet directly with Park experts about the latest cutting edge breakthroughs in nanotechnology AFM solutions. Showcased at the Park Systems booth will be Park NX10, the industry’s most accurate AFM, and the two new AFM advanced features: Step and Scan Automation, a feature that makes Park AFM very easy to use, and Approach Retract Scanning, a conductive AFM mode that greatly increases the resolution and bandwidth for conductivity studies.

“We are excited to be exhibiting at ACS Fall 2013 to meet with customers, engineers and researchers to exchange ideas and information about nanotechnology and the advancements Park has pioneered in the field of atomic force microscopy,” explains Keibock Lee, President Park Systems. “Our proven technology is designed to guarantee reliability to meet the rigorous standards for nanoscale measurements.”

At the ACS show, you can witness many AFM products including the newly launched Park NX20, a high-end, large sample atomic force microscope (AFM) for failure analysis (FA) and materials research involving large samples. The unique design of NX20 features a non-contact mode that guarantees long-running probe tip sharpness, increasing cycle life and productivity. Park Systems AFM technology provides FA and QA labs with extremely accurate surface roughness measurements for media and substrates, defect review imaging and analysis, high resolution electrical scan mode and with decoupled XY scanning, sidewall measurements for 3D structure study.

Visit us at our Park Systems Booth #1523, ACS National Meeting and Exposition Sept 8-10, 2013 in Indianapolis, IN.

About Park Systems
Park Systems serves its customers by providing a complete range of AFM solutions including AFM systems, options and software, along with global service and support. Park Systems is the leading nanotechnology solutions partner for nanoscale measurements and systems for both research and industry. The product line of Park Systems reflects its focused strength to help customers achieve the metrology performance that meets the needs and requirements of present and future applications. Since improvements in nanometrology are key to enabling tomorrow's research, analysis, processing and product manufacturing, the innovative technology and market leadership of Park Systems in the field of nanometrology will remain as the core competence and market driving force of its future business. Park’s manufacturing and engineering facilities are located in Suwon, South Korea. Global sales and service offices are located throughout the U.S., Japan, and Singapore. For more information, visit http://www.parkAFM.com.


Contact

Follow us on: Contact's Facebook Contact's Twitter