Rigaku Innovative Technologies (RIT) to Premiere MaxEuv™ Technology at SPIE Advanced Lithography 2014 Conference and Exhibition

Rigaku Innovative Technologies (RIT) will introduce MaxEuv™ technology at Booth #304 at the 2014 SPIE Advanced Lithography Conference and Exhibition in San Jose, California February 23rd - 27th.

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Auburn Hills, MI (PRWEB) February 06, 2014

Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optics for EUV lithography (EUVL), will showcase their new MaxEuv™ technology at the 2014 SPIE Advanced Lithography Conference and Exhibition in San Jose, California February 23rd - 27th.

Located at Booth #304, RIT will introduce MaxEuv to the North American Marketplace. The primary focus of their MaxEuv technology is on high-efficiency multilayer optical elements for use with 13.5 nm, 6.x nm and XUV wavelengths in applications that include Collector, Illumination and Imaging systems. RIT will provide a select assortment of custom multilayer mirrors, available in any size, shape and wavelength, all of which can be individually optimized to meet specific customer requirements.

In 2013, RIT began major renovations at their Auburn Hills, MI location to construct a state-of-the-art multilayer coating facility which supports world-wide Engineering, Manufacturing and Sales activities. The showpiece of the expansion is their custom built Inline coating tool, optimized for high throughput, precision coatings for optics up to 750mm in diameter. With over $9M invested, RIT continues to refine their EUV expertise, expand manufacturing capabilities, increase quality control, shorten time to market and provide customers with cutting edge innovative products. RIT is positioned as the Industry leader for advanced optic manufacturing and as the premier provider of EUVL Collectors, Illumination and Imaging Optics for Lithographic applications.

About RIT

RIT is at the forefront of Multilayer optic technology for EUV Lithography. Formerly Osmic Inc., RIT was the first commercial supplier of multilayer optics for X-ray Sciences. Since 1993 RIT has been a global leader in the development and supply of EUV optics thus shaping the vision of EUVL for high volume manufacturing. With hundreds of major innovations to its credit, Rigaku and its subsidiary companies are world leaders in the fields of small molecule and protein crystallography, X-ray spectrometry and diffraction, X-ray optics, as well as semiconductor metrology. Rigaku employs over 1,100 people globally and its products are in use in more than 70 countries – supporting research, development, production control and quality assurance activities. Throughout the world, Rigaku continuously promotes partnerships, dialog, and innovation within the global scientific and industrial community. For additional information about RIT and its EUV related products, please visit: http://www.rigaku.com/products/optics/euv.


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Rigaku Innovative Technologies (RIT) to Premiere MaxEuv™ Technology at SPIE Advanced Lithography 2014 conference Rigaku Innovative Technologies (RIT) to Premiere MaxEuv™ Technology at SPIE Advanced Lithography 2014 conference

Rigaku Innovative Technologies (RIT) SPIE Advanced Lithography 2014 – Booth # 304 MaxEuv™ Technology Premiere