Heidelberg, Baden-Württemberg (PRWEB) April 20, 2014
Heidelberg Instruments announced the sale of a DWL 2000 laser lithography system to the Nanofabrication Laboratory at the Department of Microtechnology and Nanoscience - MC2, Chalmers University of Technology, Sweden. The research at MC2 covers a wide range of disciplines in microtechnology and nanoscience. Large efforts, experimental as well as theoretical, are directed at materials, devices and subsystems for future micro/nanoelectronics in the fields of microwave electronics, quantum devices, photonics, micro- and bio- nanosystems, superconducting devices and circuits and molecular electronics.
The DWL 2000 laser lithography system is a fast, flexible high-resolution pattern generator for mask making and direct writing and is the perfect solution for fast patterning of masks and wafers in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures. In addition to high-resolution 2D patterns, the DWL 2000 provides a special exposure mode, known as Gray Scale lithography, to create complex 3D structures in thick photoresist. In contrary to other technologies this method enables high throughput formation of 3D microstructures over large areas. Special software tools for optimization and evaluation of Gray Scale exposures have been developed to reduce the cycle time for new products.