Solving Mask Complexity, Innovating for the Future on the Program for SPIE Photomask 2014

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Researchers, engineers, developers, and suppliers will convene in Monterey later this month for the annual SPIE Photomask Technology symposium to present the latest developments in scanning microscopies, EUV mask making and application, OPC, and more. ASML President and CTO Martin van den Brink will be this year’s keynote speaker for the event sponsored by SPIE, the international society for optics and photonics.

Keynote speaker Martin van den Brink, President and CTO of ASML, will discuss how to keep the semiconductor industry innovative and relevant alongside the constantly growing mobile device industry.

Issues in solving mask complexity and the challenges of innovating for the future will be among topics at SPIE Photomask Technology 2014, joined this year by the co-located SPIE Scanning Microscopies conference. The event runs 16-18 September at the Monterey (California, USA) Conference Center and Monterey Marriott, and is sponsored by SPIE, the international society for optics and photonics.

Registered conference attendees may attend presentations in both conferences, and a joint session will begin the conferences.

Keynote speaker Martin van den Brink, President and CTO of ASML, will discuss how to keep the semiconductor industry innovative and relevant alongside the constantly growing mobile device industry, including technology options for the 10-nanometer node and beyond.

The Photomask conference will include more than 70 presentations in sessions on mask making, EUV, 9-inch glass, emerging mask technologies, and mask business. Topics will span a number of industry-critical areas, such as current technical issues, emerging technologies, and future trends, said symposium chair Paul Ackmann of GLOBALFOUNDRIES.

Symposium cochair Naoya Hayashi of Dai Nippon Printing will moderate a discussion on mask complexity, with a panel of international industry leaders. Issues to be explored include managing data volume, reducing mask writing time, accuracy, whether EUVL will simplify mask complexity, and others.

Scanning Microscopies will offer more than 50 presentations in areas such as nanomaterials; optical and particle beam, and scanned probe; and imaging; with applications in food safety analysis, environmental monitoring, and chemical sensing. Symposium chairs are Michael Postek and Dale Newbury (National Institute of Standards and Technology), Frank Platek (U.S. Food and Drug Administration), and Tim Maugel (University of Maryland, College Park).

A free-admission exhibition will be held 16-17 September, with top industry suppliers showing products and systems using technology such as e-beam lithography, EUV, direct laser writing, resists, optical/laser microlithography, and electronic hardware and software.

Photomask Technology sponsors include Applied Materials, ASML, Hoya, Intel, Nikon, Taiwan Mask Corp, Synopsys, Zeiss, and other major companies.

Conference proceedings will be published online in the SPIE Digital Library after the event as manuscripts are approved, with CD publication following when all manuscripts are in.

About SPIE

SPIE is the international society for optics and photonics, a not-for-profit organization founded in 1955 to advance light-based technologies. The Society serves nearly 256,000 constituents from approximately 155 countries, offering conferences, continuing education, books, journals, and a digital library in support of interdisciplinary information exchange, professional networking, and patent precedent. SPIE provided more than $3.2 million in support of education and outreach programs in 2013.

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