“Accurate, reliable and fast defect identification improves yield and ensures quality. Park AFM provides the only fully automated defect review process that improves reliability and throughput by 1,000 %, which we will demonstrate in this demo."
Santa Clara, CA (PRWEB) September 22, 2014
Park Systems, a leading manufacturer of atomic force microscopy (AFM) products will be hosting a live demonstration on Sept 25, 2014 via internet at 9 am PST on how to do Surface Roughness Measurements with AFM Using Non-Contact Mode Imaging for Angstrom Level Roughness Measurement. This demo is part of a new series sponsored by Park Systems demonstrating groundbreaking techniques widely used throughout many Nanotechnology disciplines using AFM. To pre-register online for the live demo please go to: http://www.parkafm.com/index.php/medias/events/live-demo
“Accurate, reliable and fast defect identification improves yield and ensures quality,” said Keibock Lee, Park Systems President. “Park AFM provides the only fully automated defect review process that improves reliability and throughput by 1,000%, which we will demonstrate in this live demo.”
The live Demo on Sept 25 will demonstrate how to conduct Surface Roughness Measurement with AFM: Using non-contact mode imaging for angstrom level roughness measurement, one of the leading uses for AFM across many industries including Semiconductor Manufacturing where Automatic Defect Review drastically increases production yields and improves reliability.
During this presentation, Park will demonstrate measurement of surface roughness using non-contact mode on bare silicon wafer using their new NX system, including how to change cantilevers, set up the tip and sample, and perform true non-contact mode imaging. Post-analysis will be performed using Park’s image analysis software and measurement parameters needed for roughness study and comparison will be introduced.
“Characterization of surface roughness for different materials is known to be one of the most common applications of scanning probe microscopy both in research and production,” comments Park Systems Application Scientist and presenter Ardavan Zandiatashbar. “For example, both nanometer scale roughness of silicon wafers and surface quality after chemo-mechanical polishing are both key factors for successful semiconductor manufacturing.”
Park Systems offers a complete line of Atomic Force Microscopes for use in virtually every Nano Technology application from semiconductor to life science to manufacturing and offers a range of products specifically designed to meet the needs each industry. For more information about Park Systems AFM, go to http://www.parkafm.com.
About Park Systems
Park Systems is a world-leading manufacturer of atomic force microscopy (AFM) systems with a complete range of products for researchers and industry engineers in chemistry, materials, physics, life sciences, semiconductor and data storage industries. Park’s products are used by over a thousand institutions and corporations worldwide. Park’s AFM provides highest data accuracy at nanoscale resolution, superior productivity, and lowest operating cost thanks to its unique technology and innovative engineering. Park Systems, Inc. is headquartered in Santa Clara, California with its global manufacturing, and R&D headquarters in Korea. Park’s products are sold and supported worldwide with regional headquarters in the US, Korea, Japan, and Singapore, and distribution partners throughout Europe, Asia, and America. Please visit http://www.parkafm.com or call 408-986-1110 for more information.