NTNU NanoLab
The electron beam lithography features offered on the Elionix ELS-G100 are meeting the requirements for research facilities worldwide.
North Billerica, MA (PRWEB) June 09, 2015
SEMTech Solutions, in partnership with Elionix, is pleased to announce the order of a 100kV Electron Beam Lithography (EBL) system to the Norwegian University of Science and Technology (NTNU). The Elionix ELS-G100 will be installed at NTNU’s NanoLab later this year. The NTNU NanoLab is one core facility within Norway’s national cleanroom infrastructure NorFab and supports high level education, research, development and small scale production.
The Elionix ELS-G100 is capable of generating patterns with a line width of 6nm. The system provides a stable 1.8nm electron beam using high beam currents at 100kV accelerating voltage. The system’s Windows™ based Graphical User Interface (GUI) provides for ease of use in a diverse, multi-user environment.
“The electron beam lithography features offered on the Elionix ELS-G100 are meeting the requirements for research facilities worldwide,” states Dr. Kay Gastinger, Director NTNU NanoLab. “This purchase significantly upgrades our electron beam lithography capability.”
The Elionix ELS-G100 is a recent product launch that incorporates a new 100MHz high speed deflection system. According to Ken Koseki, Overseas Sales Manager for Elionix in Japan, “This system offers up to 10 times the throughput of our previous generation EBL tools.” Further, he states, “We are excited that NTNU has chosen Elionix and look forward to a long term partnership.”
About NTNU NanoLab:
NTNU NanoLab aims to facilitate a collaborating research environment for scientists within the fields of physics, chemistry, biology, electrical engineering, materials technology and medical research. There are more than 70 permanent employees with research interests towards areas where nanotechnology and nanoscience plays an important part. The cleanroom is especially designed for interdisciplinary research. It has fully vibration damped ISO-79 to ISO-5 zones equipped for: Chemical methods, including chemical synthesis with emphasis on particle synthesis as well as spin and dip coating. Physical methods involving thin film growth and high resolution lithography techniques. Bionanotechnological methods including soft lithography line and biological work spaces. In addition, there are a number of characterization methods available, and a designated cleanroom area for education.
About Elionix:
Established 40 years ago, Elionix manufactures systems that utilize particle beams; electron, ion, and electromagnetic waves that include light and x-ray. Over the years, Elionix has manufactured more than 350 dedicated electron beam lithography systems and maintains the largest market share in Japan, which is widely known for world class electron beam design and development.
About SEMTech Solutions:
SEMTech Solutions is the exclusive sales and service representative for Elionix in North America and Europe.
