Heidelberg, Baden-Württemberg (PRWEB) April 26, 2016
Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announces the latest technology innovation for its Volume Pattern Generator (VPG) line of lithography systems. The breakthrough VPG+ system is designed to fulfill tomorrow’s demand for production of advanced photomasks as well as a solution for mid volume direct write lithography applications. It utilizes the latest innovations in software, electronics and optics, including a newly and custom designed spatial light modulator powering an unmatched exposure speed with excellent image quality specifications. The VPG+ is a robust platform and provides a reliable solution with the lowest cost of ownership.
“With the VPG+ System, we’ve drawn from our leadership in direct write lithography technology to address unmet challenges in production of photomasks that require exposure of very complex patterns,” states Alexander Forozan, Head of Global Sales and Business Development. “The VPG+ system overcomes fundamental limitations experienced by photomask production groups with conventional direct lithography tools based on AOM/AOD technologies, namely throughput, running cost, and reliability. Our new system, equipped with a cutting-edge and customized SLM, will enable customers to expose a fully populated pattern on a 300mm by 300mm mask in about 30 minutes, and provides them the capability of creating features down to one micron with an address grid as small as 25nm”.
The VPG+ can be configured to accommodate substrate sizes up to 1100mm by 1400mm and is equipped with an innovative stage platform as well as semi or fully automatic feeder for substrate loading. The tool is configured with an automated resolution-exchanging unit (Automatic Write Mode), providing an ideal synergy between throughput and design features for various applications.
About Heidelberg Instruments, GmbH: With an installation base of over 650 systems in more than 50 countries, Heidelberg Instruments Mikrotechnik GmbH is a world leader in production of high precision maskless lithography systems. Due to their flexibility, these systems are used in research, development and industrial applications for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.