Heidelberg Instruments receives orders for advanced VPG+ Volume Pattern Generator from two Asian based photomask suppliers

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Heidelberg Instruments GmbH, leading supplier of maskless aligner and laser lithography systems, announced orders for advanced VPG+ 800 Volume Pattern Generators from two major Asian based phtotomask production groups.

'We are very pleased with these latest orders. We continually innovate and improve products to enable our customers to enhance their production capabilities and overcome technology challenges,' states Alexander Forozan.

Heidelberg Instruments GmbH, leading supplier of maskless aligner and laser lithography systems, announced orders for advanced VPG+ 800 Volume Pattern Generators from two major Asian based phtotomask production groups.

The breakthrough VPG+ system is designed to fulfill tomorrow’s demand for production of advanced photomasks as well as a solution for mid volume direct write lithography applications. It utilizes the latest innovations in software, electronics and optics, including a newly and custom designed spatial light modulator powering an unmatched exposure speed with excellent image quality specifications. The VPG+ is a robust platform and provides a reliable solution with the lowest cost of ownership.

“We are very pleased with these latest orders. We continually innovate and improve products to enable our customers to enhance their production capabilities and overcome technology challenges,” states Alexander Forozan, VP of Sales and Business Development. “With the VPG+ System, we’ve drawn from our leadership in direct write lithography technology to address unmet challenges in production of large area photomasks that require exposure of very complex patterns”.

About Heidelberg Instruments, GmbH: With an installation base of over 800 systems in more than 50 countries, Heidelberg Instruments Mikrotechnik GmbH is a world leader in the production of high-precision laser and maskless lithography systems. Due to their flexibility, power and versatility, these systems are employed for direct writing and photomask production in a wide range of settings and applications in research, development, and industry. Customers include some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, nanotechnology, ASICS, TFT, displays, micro optics, and many other related applications.

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Marie Anne Schneeweiß
Heidelberg Instruments GmbH
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