OAI Introduces a New, Economical Tabletop Mask Aligner System for 300mm or 12”x12” Substrates

Share Article

Mask Aligner & Light Source innovator, OAI, responds to industry requirement for a lower cost R&D tool for 300mm wafers

The new Model 212 Mask Aligner fills the void for those researchers who require a versatile, cost effective 300mm mask aligner system for R&D.

Model 212 Mask Aligner System

Dr. Charles Turk, President of OAI, explains, “By building on OAI’s proven Model 200 tabletop mask aligner technology (designed for substrates up to 8 inches in diameter), the new Model 212 Mask Aligner will prove ideal for larger substrate sizes."

OAI, a leading Silicon Valley, CA-based manufacturer of advanced precision Lithography Equipment for the Semiconductor, MEMS, and Microfluidics Industries, announced today the introduction of the Model 212 Mask Aligner System. In response to industry demands for a low cost R&D mask aligner for developing larger substrates (up to 12”x12” or 300mm diameter), OAI has developed the new Model 212 Table Top Mask Aligner System. The new system is based on OAI’s proven modular approach leveraging their extensive experience with the Model 200, tabletop mask aligner. The venerable OAI Model 200 Mask Aligner System is an entry-level tool that is installed in R&D labs worldwide.

Model 212 Mask Aligner System
The Model 212 Mask Aligner System is engineered to accommodate 12’x12” or 300mm substrates as well as smaller size mask inserts and substrate holders; thus adding to the versatility of the tool. The Model 212 is especially useful for research and development labs. Dr. Charles Turk, President of OAI, explains, “By building on OAI’s proven Model 200 tabletop mask aligner technology (designed for substrates up to 8 inches in diameter), the new Model 212 Mask Aligner will prove ideal for larger substrate sizes. The system has quickly gained acceptance with customers worldwide. With our modular design approach, OAI can now offer the highest quality, precision mask aligners at the lowest total cost of ownership.” Turk continues, “the new Model 212 Mask Aligner fills the void for those researchers who require a versatile, cost effective 300mm mask aligner system for R&D.” The proven, OAI modular platform serves as the core of this custom-configured photolithography system. Benefits of this approach include cost containment, improved reliability, and increased system flexibility.

About OAI
Headquartered in San Jose, CA, OAI has developed a time-tested platform of modularized subsystems, which serve as the core of a custom configured photolithography system. This proven approach controls cost, improves reliability, increases system flexibility, and ultimately reduces the overall cost of ownership. All OAI products are manufactured in the USA in San Jose, CA and are in use worldwide. OAI is a member of SEMI and the MEMS & Sensors Industry Group. The product line includes Mask Aligner Systems, UV Light Sources, LED UV Light Sources, Solar Simulators, I-V Test Systems and UV Measurement Instruments. Cost-effective, affordable solutions with precise specs are the hallmark of the OAI brand.

For more information:
http://www.oainet.com
sales(at)oainet(dot)com
685 River Oaks Parkway
(408) 232-0600

Media contact:
Robert Goldberg
robert(at)startupfactory(dot)biz
(415) 987-6677

http://www.oainet.com

Share article on social media or email:

View article via:

Pdf Print

Contact Author

Robert Goldberg
robert@startupfactory.biz
+1 (415) 987-6677
Email >
Visit website