Complexity in ICs Drives Thin Film Metrology Systems Market Growth, Says a New Research Report at

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Global Thin Film Metrology Systems Market 2015-2019 is a new research report added to store. KLA-Tencor, Nanometrics, Nova Measuring Instruments, Rudolph Technologies are the key vendors profiled in this report.

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One of the major trends in the Thin Film Metrology Systems market is the increase in demand for integration and miniaturization of semiconductor devices. High level of integration to add functionalities on a single device is leading to the miniaturization of ICs which is accelerating the demand for thin film metrology systems to effectively enable a semiconductor manufacturing process.

The semiconductor vendors sell their solutions to original design manufacturers (ODMs), and original equipment manufacturers (OEMs), globally. So the “Global Thin-film Metrology Systems market” report calculates the market size considering the revenue generated from the sales of thin film metrology systems to various end-users to calculate the market size, that including: ODMs, OEMs and Foundries.

Analysts forecast the market will grow at a CAGR of 3.4% over the period 2014-2019. According to the report, one of the main drivers of the market is the increased level of complexity in ICs. Over the years, the number of functions an IC has been able to do has increased considerably, resulting in the introduction of complex architectures such as 3D and FinFET. This is expected to foster the demand for thin film metrology systems as they are used in the manufacturing of complex semiconductor ICs.

A Thin Film Metrology Ellipsometry System can include integrated spectrometer, a computer, monitor, broadband light source and controller; software is available separately. Easy placement of the sample and one-button operation make such products convenient to use. While a Thin Film Reflectometry system is reliable, powerful, portable and sophisticated. An ability to analyze single- or multi-layers films make the system powerful while the portability is measured based on its ideal for in situ, on-line thickness measurements.

According to a leading thin-film metrology tool maker for the photovoltaic industry, there is a need for improved in-line, real-time metrology during solar panel production. Such metrology tools not only help to improve the efficiency of the technology, but also improve the reliability of solar panel.

The report recognizes the following companies as the key players in the Global Thin Film Metrology Systems Market: KLA-Tencor Corp., Nanometrics Inc., Nova Measuring Instruments Ltd. and Rudolph Technologies Inc.

Other Prominent Vendors in the market are: Hitachi High-Technologies, SCREEN Holdings and Semilab. Order a copy of the report at (Single User License of this report is US $2500).

Further, the report states that the cyclical nature of the semiconductor industry is one of the main challenges in the market. The revenue generated in the Semiconductor industry is cyclical in nature which acts as a major challenge for thin film metrology systems as they are dependent on the economic condition and the capital expenditure cycle of semiconductor manufacturers. Often production tends to exceed the demand during economic downturn, resulting in inventory pileup and, thus, low demand for semiconductor devices.

Explore other new reports on Semiconductor & Electronics at

About US is an online market research store for research reports on multiple industries. These reports provide market analysis, trends and opportunities and forecast about industries that helps to make a right decision for the business.

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Ritesh Tiwari
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Sandler Research
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