MINNEAPOLIS (PRWEB) August 17, 2020
Leading semiconductor test manufacturer Johnstech International added a state-of-the-art air cleaning system to their already robust rooftop HVAC units at their Minneapolis headquarters in an increased effort to protect its international supply chain. This change comes after weeks of expanding production capacity in response to an increase in demand from customers who provide semiconductor chips used in critical medical devices and communications infrastructure.
The cleaning systems are manufactured by Global Plasma Solutions and utilize bi-polar ionization to reduce airborne pathogens including coronavirus, norovirus, and MRSA. Director of Operations John G. Roy explains that since the beginning of the COVID-19 pandemic, Johnstech has taken an assertive approach to support the business. “We’re proud to be a Minnesota manufacturer making a global impact on technology,” says Roy. “Adding this air cleaning system to each of the 22 units is just one more layer to protect our employees and our customers who depend on our business.”
Johnstech International is a key supplier to semiconductor companies across many essential industries including medical devices, communications, and critical infrastructure has been committed to protecting its operations and employees during this pandemic. Prior to adding the new air cleaning system, Johnstech had already expanded their safety stands to include frequent facility cleaning, adding an on-site nurse for temperature checks, remote working, and instituting strict social distancing, and mandating mask-wearing.
JOHNSTECH INTERNATIONAL is a global R&D leader in the field of testing, providing reliable, cost-effective testing solutions for automotive, commercial, and industrial applications. Founded in 1991 by David Johnson, Johnstech works hand-in-hand with the world’s most respected OSATs, foundries, and EDA companies to develop the most precise and dependable test contactors on the marketplace today. For more info, visit http://www.johnstech.com.